spatial light modulator digital micromirror device dmd  (Texas Instruments)

Journal: Review of Scientific Instruments

Article Title: Versatile maskless microscope projection photolithography system and its application in light-directed fabrication of DNA microarrays

doi: 10.1063/1.2213152

Figure Lengend Snippet: FIG. 9. MPLS-generated pattern in SU-8 photoresist—film thickness: 40 m. a The pattern geometry is the same as in Fig. 6. Each block corresponds to 44 pixels, and the separation gap is 1 pixel wide. Some of the letters are lying sideways on the surface, demonstrating that an aspect ratio of 1:10 is achievable with MPLS scale bar of 100 m. b Micrograph of the same pattern as in a. Even small features like the number “7” with a linewidth of only 3.5 m corresponding to a single micromirror, the pixelation is clearly visible are reproduced in the photoresist scalebar 50 m. c Electron micrograph of the photoresist structures. Due to relatively poor surface adhesion of the photoresist the structures have partly detached from the glass surface scale bar of 10 m.

Article Snippet: Downloaded to IP: 142.132.1.147 On: Mon, 15 Sep 2014 06:13:47 This artic Versatile maskless microscope projection photolithography system and its application in light-directed fabrication of DNA microarrays Thomas Naiser,a Timo Mai, Wolfgang Michel, and Albrecht Ott Experimentalphysik I, Universität Bayreuth, D-95440 Bayreuth, Germany Received 26 November 2005; accepted 17 May 2006; published online 27 June 2006 We present a maskless microscope projection lithography system MPLS , in which photomasks have been replaced by a Digital Micromirror Device type spatial light modulator DMDTM, Texas Instruments .

Techniques: Generated, Blocking Assay